Cylindrical Target
Until now, the target shape was generally planar (flat), but in recent years, sputtering equipment has made it possible to use rotary (cylindrical) type targets, and we were quick to mass-produce them, contributing to our customers' process improvements.
Moreover, the quality is exactly the same as that of flat-type targets.
Currently, in addition to ITO targets, we have succeeded in mass-producing IGZO targets, and are able to provide targets with a variety of compositions.
Applications
Characteristic value ITO
| standard | unit | remarks | ||
|---|---|---|---|---|
| composition | In2O3 | balance | wt.% | - |
| SnO2 | 3,5,7,10 ※1 | - | ||
| purity | ITO | ≧99.99 | % | - |
| Relative Density | ≧99.5 ※2 | % | - | |
*1 Standard composition. Other compositions are also available upon request.
*2 10wt% SnO2-ITO
Characteristic value IGZO
| standard | unit | remarks | ||
|---|---|---|---|---|
| Composition *1 | In | 1 | at ratio | - |
| Ga | 1 | - | ||
| Zn | 1 | - | ||
| purity | IGZO | ≧99.99 | % | - |
| Relative Density | ≥99.5 | % | - | |
*1 In addition to In:Ga:Zn:O=1:1:1:4, we can manufacture various compositions.
Production Base
Japan: 2081 Tofune, Omuta City, Fukuoka Prefecture (Miike target Plant)
Taiwan: No. 6, Wei 5th Rd., Wuqi Dist., Taichung City (Mitsui Electronic Materials Co.,Ltd.)
