Cylindrical Target

Until now, the target shape was generally planar (flat), but in recent years, sputtering equipment has made it possible to use rotary (cylindrical) type targets, and we were quick to mass-produce them, contributing to our customers' process improvements.
Moreover, the quality is exactly the same as that of flat-type targets.
Currently, in addition to ITO targets, we have succeeded in mass-producing IGZO targets, and are able to provide targets with a variety of compositions.

Applications

For flat panel displays and touch panels

Characteristic value ITO

  standard unit remarks
composition In2O3 balance wt.% -
SnO2 3,5,7,10 ※1 -
purity ITO ≧99.99 % -
Relative Density ≧99.5 ※2 % -

*1 Standard composition. Other compositions are also available upon request.
*2 10wt% SnO2-ITO

Characteristic value IGZO

  standard unit remarks
Composition *1 In 1 at ratio -
Ga 1 -
Zn 1 -
purity IGZO ≧99.99 % -
Relative Density ≥99.5 % -

*1 In addition to In:Ga:Zn:O=1:1:1:4, we can manufacture various compositions.

Production Base

Japan: 2081 Tofune, Omuta City, Fukuoka Prefecture (Miike target Plant)
Taiwan: No. 6, Wei 5th Rd., Wuqi Dist., Taichung City (Mitsui Electronic Materials Co.,Ltd.)

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