Sputtering Targets

Sputtering targets are the raw material used to create thin films by sputtering.
Sputtering is a method of creating a thin film by bombarding a target material with Ar ions in a vacuum, and depositing the target material (atoms) ejected onto a substrate on the opposite side, as shown in the figure.
The target material is generally a circular or rectangular plate several millimeters thick, bonded to a backing plate.